Array substrate, method of manufacturing the same and liquid crystal display apparatus having the same

ABSTRACT

An array substrate includes a plate, a switching element, an insulating layer and a pixel electrode. The plate includes a pixel region, and the switching element is disposed on the plate. The insulating layer is disposed on the plate to include an opening for a multi-domain disposed in the pixel region and a contact hole. An electrode of the switching element is partially exposed through the contact hole. The pixel electrode is disposed on the insulating layer corresponding to the pixel region, an inner surface of the opening for the multi-domain and an inner surface of the contact hole so that the pixel electrode is electrically connected to the electrode of the switching element. Therefore, the viewing angle and the image display quality of the LCD apparatus are improved, and a manufacturing process is simplified.

CROSS REFERENCE

This patent application is a Continuation Application of U.S.application Ser. No. 11/004,152, filed Dec. 3, 2004, now U.S. Pat. No.7,511,788, issued on Mar. 31, 2009, which claims priority to and thebenefit of Korean Patent Application No. 2003-90602, filed on Dec. 12,2003 and Korean Patent Application No. 2004-1323, filed on Jan. 8, 2004,the contents of which are hereby incorporated by reference herein intheir entirety.

BACKGROUND

1. Field of the Invention

The present invention relates to an array substrate, a method ofmanufacturing the array substrate and a liquid crystal display (LCD)apparatus having the array substrate. More particularly, the presentinvention relates to an array substrate capable of improving viewingangle and simplifying manufacturing process, a method of manufacturingthe array substrate and an LCD apparatus having the array substrate.

2. Description of the Related Art

In general, a liquid crystal in an LCD apparatus varies an arrangementin response to an electric field applied thereto, and thus a lighttransmittance thereof may be altered. The liquid crystal is interposedbetween an array substrate having a thin film transistor (TFT) and acolor filter substrate, and has an anisotropic dielectric constant.

The liquid crystal of the LCD apparatus is anisotropic so that an imagedisplay quality is dependent on the angle of a viewpoint. In aconventional LCD apparatus, the range of the viewpoint angle isrestricted so that the image display quality is deteriorated. When theLCD apparatus is used as a monitor, the viewpoint angle may be more than90°. The viewpoint angle having a contrast ratio of more than about 10:1is defined as a viewing angle of the LCD apparatus. The contrast ratiois a ratio of a luminance of a dark image to a luminance of a brightimage. When the LCD apparatus displays a darker image, and has moreuniform luminance, the contrast ratio of the LCD apparatus increases.

The LCD apparatus may include a black matrix having a decreasedreflectivity and use a normally black mode so as to prevent the leakageof a light and to display the darker image. When a voltage is notapplied to a common electrode and a pixel electrode of the LCD apparatushaving the normally black mode, a black image is displayed. In order touniformize the luminance, the LCD apparatus includes a compensation filmor a liquid crystal layer having a multi-domain. The liquid crystallayer having the multi-domain has a plurality of domains.

The LCD apparatus forming the multi-domain includes a mixed verticalalignment (MVA) mode, a patterned vertical alignment (PVA) mode, anin-plane switching (IPS) mode, etc.

When the LCD apparatus includes the MVA mode, a plurality of protrusionsis formed on the color filter substrate and/or a thin film transistor(TFT) substrate to form the multi-domain, thereby increasing the viewingangle of the LCD apparatus. The protrusions are formed on the colorfilter substrate and/or the TFT substrate through additional processes,for example, such as coating process, photo process, etc., therebyincreasing the manufacturing cost of the LCD apparatus. In addition,when the color filter substrate is misaligned with the TFT substrate,the protrusions may not form the multi-domain so that the yield of theLCD apparatus is decreased.

When the LCD apparatus includes the PVA mode, a plurality of slits isformed in the common electrode to distort the electric field in theliquid crystal layer to form the multi-domain, thereby increasing theviewing angle of the LCD apparatus. When the color filter substrate ismisaligned with the TFT substrate, the slits may form a distortedmulti-domain, thereby deteriorating the image display quality.

When the LCD apparatus includes the IPS mode, the TFT substrate includesa plurality of electrodes disposed substantially parallel with oneanother to form the distorted electric field. The LCD apparatusincluding the IPS mode, however, has decreased luminance.

In addition, the LCD apparatus forming the multi-domain is manufacturedthrough the additional processes so that the manufacturing cost of theLCD apparatus is increased.

SUMMARY

The present invention provides an array substrate capable of improvingviewing angle and simplifying manufacturing process.

The present invention also provides a method of manufacturing theabove-mentioned array substrate.

The present invention also provides an LCD apparatus having theabove-mentioned array substrate.

An array substrate in accordance with an aspect of the present inventionincludes a plate, a switching element, an insulating layer and a pixelelectrode.

The plate includes a pixel region. The switching element is disposed onthe plate. The insulating layer is disposed on the plate to include anopening for a multi-domain disposed in the pixel region and a contacthole. An electrode of the switching element is partially exposed throughthe contact hole. The pixel electrode is disposed on the insulatinglayer corresponding to the pixel region, an inner surface of the openingfor the multi-domain and an inner surface of the contact hole so thatthe pixel electrode is electrically connected to the electrode of theswitching element.

An array substrate in accordance with another aspect of the presentinvention includes a plate, an insulating layer and a pixel electrode.

The plate includes a pixel region having a transmission window and aswitching element disposed in the pixel region. A light passes throughthe transmission window. The insulating layer is disposed on the plateto include a plurality of openings for a multi-domain disposed in thepixel region and a contact hole. An electrode of the switching elementis partially exposed through the contact hole. The pixel electrode isdisposed on the insulating layer corresponding to the pixel region, aninner surface of the openings for the multi-domain and an inner surfaceof the contact hole so that the pixel electrode is electricallyconnected to the electrode of the switching element.

A method of manufacturing the array substrate in accordance with anaspect of the present invention is provided as follows.

A switching element is formed on a plate including a pixel region. Aninsulating layer is formed on the plate. The insulating layer includesan opening for a multi-domain disposed in the pixel region and a contacthole. An electrode of the switching element is partially exposed throughthe contact hole. A pixel electrode is formed on the insulating layer,an inner surface of the opening for the multi-domain and an innersurface of the contact hole. The pixel electrode is electricallyconnected to the electrode of the switching element.

A method of manufacturing the array substrate in accordance with anotheraspect of the present invention is provided as follows.

An insulating layer is formed on a plate including a pixel region havinga transmission window, and includes a plurality of openings for amulti-domain disposed in the transmission window and a contact hole. Alight passes through the transmission window, and an electrode of theswitching element is partially exposed through the contact hole. A pixelelectrode is formed on the insulating layer, an inner surface of theopenings for the multi-domain and an inner surface of the contact hole.The pixel electrode is electrically connected to the electrode of theswitching element.

A method of manufacturing the array substrate in accordance with stillanother aspect of the present invention is provided as follows.

A gate electrode is formed on a plate including a pixel region having atransmission window. A light passes through the transmission window. Agate insulating layer is formed on the plate having the gate electrode.A switching element is formed on the gate insulating layer. Theswitching element includes a semiconductor layer pattern, a sourceelectrode and a drain electrode. A transparent insulating material isdisposed over the substrate having the switching element. The depositedtransparent insulating material and the gate insulating layer are etchedto form a plurality of openings for a multi-domain that is disposed inthe transmission window and a contact hole. The drain electrode ispartially exposed through the contact hole. A transparent electrode isformed on the organic layer corresponding to the pixel region, an innersurface of the openings for the multi-domain and an inner surface of thecontact hole. A reflection electrode is formed in a reflection region ofthe pixel region. An externally provided light is reflected from thereflection electrode.

A display apparatus in accordance with an aspect of the presentinvention includes a first substrate, a second substrate and a liquidcrystal layer.

The second substrate includes a plate having a pixel region, a switchingelement disposed on the plate, an insulating layer and a pixelelectrode. The pixel electrode is disposed on the insulating layercorresponding to the pixel region, an inner surface of the opening forthe multi-domain and an inner surface of the contact hole so that thepixel electrode is electrically connected to the electrode of theswitching element. The insulating layer is disposed on the plate, andincludes an opening for a multi-domain and a contact hole. The openingfor a multi-domain is disposed in the pixel region and a contact hole.An electrode of the switching element is partially exposed through thecontact hole. The second substrate corresponds to the first substrate.The liquid crystal layer is interposed between the first and secondsubstrates.

A display apparatus in accordance with another aspect of the presentinvention includes a first substrate, a second substrate and a liquidcrystal layer.

The second substrate includes a plate including a pixel region having atransmission window and a switching element disposed in the pixelregion, an insulating layer, and a pixel electrode. The insulating layeris disposed on the plate, and includes a plurality of openings for amulti-domain disposed in the pixel region and a contact hole. Anelectrode of the switching element is partially exposed through thecontact hole. A light passes through the transmission window. The pixelelectrode is disposed on the insulating layer corresponding to the pixelregion, an inner surface of the openings for the multi-domain and aninner surface of the contact hole so that the pixel electrode iselectrically connected to the electrode of the switching element. Thesecond substrate corresponds to the first substrate. The liquid crystallayer is interposed between the first and second substrates.

The LCD apparatus includes a reflective type LCD apparatus, atransmissive type LCD apparatus, a reflective-transmissive type LCDapparatus, etc.

The switching element includes a thin film transistor (TFT), a fieldeffect transistor (FET), etc.

Therefore, the insulating layer includes the openings for themulti-domain so that the viewing angle and the image display quality ofthe LCD apparatus are improved.

In addition, the openings for the multi-domain are disposed on thesecond substrate so that the LCD apparatus includes the multi-domainhaving improved characteristics, although the first substrate ismisaligned with the second substrate.

Furthermore, the openings for the multi-domain are formed from a samelayer as the contact hole so that the manufacturing process issimplified and the manufacturing cost is decreased.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other advantages of the present invention will become moreapparent by describing in detail exemplary embodiments thereof withreference to the accompanying drawings, in which:

FIG. 1 is a plan view illustrating an LCD apparatus according to anexemplary embodiment of the present invention;

FIG. 2 is a plan view illustrating a multi-domain formed in atransmission window shown in FIG. 1;

FIG. 3 is a cross-sectional view taken along the I-I′ line shown in FIG.1;

FIG. 4 is a cross-sectional view taken along the II-II′ line shown inFIG. 1;

FIGS. 5A to 5H are cross-sectional views illustrating a method ofmanufacturing an LCD apparatus according to an exemplary embodiment ofthe present invention;

FIG. 6 is a plan view illustrating an LCD apparatus according to anotherexemplary embodiment of the present invention;

FIG. 7 is a plan view illustrating multi-domains formed in atransmission window shown in FIG. 6;

FIG. 8 is a cross-sectional view taken along the III-III′ line shown inFIG. 6;

FIG. 9 is a plan view illustrating an LCD apparatus according to anotherexemplary embodiment of the present invention;

FIG. 10 is a plan view illustrating an LCD apparatus according toanother exemplary embodiment of the present invention;

FIG. 11 is a plan view illustrating an LCD apparatus according toanother exemplary embodiment of the present invention;

FIG. 12 is a plan view illustrating a multi-domain formed in atransmission window shown in FIG. 11;

FIG. 13 is a cross-sectional view taken along the IV-IV′ line shown inFIG. 11;

FIG. 14 is a cross-sectional view taken along the V-V′ line shown inFIG. 11;

FIG. 15 is a plan view illustrating an LCD apparatus according to anexemplary embodiment of the present invention;

FIG. 16 is a plan view illustrating a multi-domain formed in atransmission window shown in FIG. 15;

FIG. 17 is a cross-sectional view taken along the VI-VI′ line shown inFIG. 16;

FIG. 18 is a plan view illustrating an LCD apparatus according to anexemplary embodiment of the present invention;

FIG. 19 is a plan view illustrating a multi-domain formed in atransmission window shown in FIG. 18;

FIG. 20 is a cross-sectional view taken along the VII-VII′ line shown inFIG. 18;

FIG. 21 is a plan view illustrating an LCD apparatus according toanother exemplary embodiment of the present invention; and

FIG. 22 is a cross-sectional view taken along the VIII-VIII′ line shownin FIG. 21.

DETAILED DESCRIPTION OF THE EMBODIMENT(S)

It should be understood that the exemplary embodiments of the presentinvention described below may be varied in many different ways withoutdeparting from the inventive principles disclosed herein, and the scopeof the present invention is therefore not limited to these particularfollowing embodiments. Rather, these embodiments are provided so thatthis disclosure will be through and complete, and will fully convey theconcept of the invention to those skilled in the art by way of exampleand not of limitation.

Hereinafter, the present invention will be described in detail withreference to the accompanying drawings.

FIG. 1 is a plan view illustrating an LCD apparatus according to anexemplary embodiment of the present invention. FIG. 2 is a plan viewillustrating a multi-domain formed in a transmission window shown inFIG. 1. FIG. 3 is a cross-sectional view taken along the I-I′ line shownin FIG. 1. FIG. 4 is a cross-sectional view taken along the Ii-II′ lineshown in FIG. 1.

Referring to FIGS. 1 to 4, the LCD apparatus includes a first substrate170, a second substrate 180 and a liquid crystal layer 108.

The first substrate 170 includes an upper plate 100, a black matrix 102,a color filter 104, a common electrode 106 and a spacer 110. The secondsubstrate 180 includes a lower plate 120, a thin film transistor (TFT)119, a source line 118 a′, a gate line 118 b′, a gate insulating layer126, a passivation layer 116, a transparent electrode 112 and areflection electrode 113. The liquid crystal layer 108 is interposedbetween the first and second substrates 170 and 180.

The second substrate 180 includes a pixel region 140 and a blockingregion 145. An image is displayed in the pixel region 140, and a lightis blocked in the blocking region 145. The pixel region 140 includes atransmission window 129 a and a reflection region 128. A light generatedfrom a backlight assembly passes through the transmission window 129,and a light that is externally provided to the LCD apparatus isreflected from the reflection region 128. For example, the transmissionwindow 129 a may have a rectangular shape.

The upper and lower plates 100 and 120 include a transparent glass. Thelight may pass through the transparent glass. The upper and lower plates100 and 120 do not include alkaline ions. When the upper and lowerplates 100 and 120 include the alkaline ions, the alkaline ions may bedissolved in the liquid crystal layer 108 to decrease the resistivity ofthe liquid crystal layer 108, thereby decreasing the image displayquality and the adhesive strength between a sealant and the plates 100and 120. In addition, the characteristics of the TFT 119 may bedeteriorated.

Alternatively, the upper and lower substrates 100 and 120 may alsoinclude triacetylcellulose (TAC), polycarbonate (PC), polyethersulfone(PES), polyethyleneterephthalate (PET), polyethylenenaphthalate (PEN),polyvinylalcohol (PVA), polymethylmethacrylate (PMMA), cyclo-olefinpolymer (COP), etc.

The upper and lower substrates 100 and 120 are optically isotropic.Alternatively, the upper and lower substrates 100 and 120 may beoptically an isotropic.

The black matrix 102 is disposed in the reflection region 128 of theupper plate 100 to block the internally and externally provided lights.The black matrix 102 blocks the light passing through the blockingregion 145 to improve the image display quality.

A metallic material or an opaque organic material is deposited on theupper plate 120 and etched to form the black matrix 102. The metallicmaterial of the black matrix 102 includes chrome (Cr), chrome oxide(CrOx), chrome nitride (CrNx), etc. The opaque organic material includescarbon black, a pigment compound, a colorant compound, etc. The pigmentcompound may include a red pigment, a green pigment and a blue pigment,and the colorant compound may include a red colorant, a green colorantand a blue colorant. Alternatively, the opaque organic materialcomprising photoresist may be coated on the upper plate 100 to form theblack matrix 102 through a photo process. The edges of a plurality ofthe color filters may also be overlapped one another to form the blackmatrix 102.

The color filter 104 is formed on the upper plate 100 having the blackmatrix 102 so that the internally and externally provided lights havinga predetermined wavelength may pass through the color filter 104. Thecolor filter 104 includes a photo initiator, a monomer, a binder, apigment, a dispersant, a solvent, a photoresist, etc. The color filter104 may be disposed on the lower plate 120 or the passivation layer 116.

The common electrode 106 is formed on the upper plate 100 having theblack matrix 102 and the color filter 104. The common electrode 106includes a transparent conductive material, for example, such as indiumtin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZO), etc.Alternatively, the common electrode 106 may be disposed in substantiallyparallel with the transparent electrode 112 and the reflection electrode113.

The spacer 110 is formed on the upper plate 100 having the black matrix102, the color filter 104 and the common electrode 106. The firstsubstrate 170 is spaced apart from the second substrate 180 by thespacer 110. In this exemplary embodiment, the spacer 110 is disposed ata position corresponding to the black matrix 102, and includes a columnshape. Alternatively, the spacer 110 may include a ball shaped spacer ora mixture of the column shaped spacer and the ball shaped spacer.

The TFT 119 is disposed in the reflection region 128 of the lower plate120, and includes a source electrode 118 a, a gate electrode 118 b, adrain electrode 118 c and a semiconductor layer pattern. A drivingintegrated circuit (not shown) applies the source electrode 118 a with adata voltage through the source line 118 a′, and applies the gateelectrode 118 b with a gate signal through the gate line 118 b′.

A storage capacitor (not shown) is formed on the lower plate 120 tomaintain a voltage difference between the reflection electrode 113 andthe common electrode 106 and a voltage difference between thetransparent electrode 112 and the common electrode 106. The storagecapacitor (not shown) may have an end-gate type or an isolated linetype.

The gate insulating layer 126 is formed over the lower plate 120 havingthe gate electrode 118 b so that the gate electrode 118 b iselectrically insulated from the source electrode 118 a and the drainelectrode 118 c. The gate insulating layer 126 may include silicon oxide(SiOx), silicon nitride (SiNx), etc.

The passivation layer 116 is disposed over the lower plate 120 havingthe TFT 119. The passivation layer 116 includes a contact hole. Thedrain electrode 118 c is partially exposed through the contact hole. Thepassivation layer 126 may include the silicon oxide (SiOx), the siliconnitride (SiNx), etc.

The passivation layer 116 includes an opening 130 a for a multi-domainto form the multi-domain in the liquid crystal layer 108. The opening130 a for the multi-domain is disposed in the transmission window 129 a.In this exemplary embodiment, the opening 130 a for the multi-domain isdisposed on the central line of the transmission window 129 a, and hasan extended rectangular shape. The gate insulating layer 126corresponding to the opening 130 a for the multi-domain is also opened.

The organic layer 114 is disposed on the lower plate 120 having the TFT119 and the passivation layer 126 so that the TFT 119 is electricallyinsulated from the transparent electrode 112 and the reflectionelectrode 113. The organic layer 114 includes a contact hole. Theorganic layer 114 defines the transmission window 129 a. Thetransmission window 129 a is opened, and a portion of the drainelectrode 118 c is exposed through the contact hole.

The organic layer 114 adjusts the thickness of the liquid crystal layer108 so that the liquid crystal layer 108 has a first thicknesscorresponding to the reflection region 128 and a second thicknesscorresponding to the transmission window 129 a. The second thickness isdifferent from the first thickness corresponding to the reflectionregion 128.

The organic layer 114 also planarizes the lower plate 120 having the TFT119, the source line 118 a′, the gate line 118 b′, etc.

In this exemplary embodiment, the organic layer 114 includes convex andconcave disposed on the upper surface of the organic layer 114. The,convex and concave improve the reflectivity of the reflection electrode113. A protruded portion 115 is disposed on a portion of the organiclayer 114 where the source line 118 a′ is overlapped with the gate line118 b′. The protruded portion 115 corresponds to the spacer 110, therebycontrolling the arrangement of a vertically aligned liquid crystal ofthe liquid crystal layer 108. In this exemplary embodiment, theprotruded portion 115 makes contact with the spacer 110. Therefore, themulti domain is formed in the liquid crystal layer 108.

Referring again to FIG. 2, four domains are disposed in the transmissionwindow 129 a. The multi-domain includes the four domains, and a centerof the multi-domain corresponds to the opening 130 a for themulti-domain. The four domains are disposed adjacent to the opening 130a for the multi-domain.

The transparent electrode 112 is formed on the organic layer 114corresponding to the pixel region 140, in the contact hole and in thetransmission window 129 a so that the transparent electrode 112 iselectrically connected to the drain electrode 118 c. When the voltagesare applied to the common electrode 106 and the transparent electrode112, the liquid crystal of the liquid crystal layer 108 is controlled sothat the light transmittance of the liquid crystal layer 108 is changed.The transparent electrode 112 includes indium tin oxide (ITO), indiumzinc oxide (IZO), zinc oxide (ZO), etc.

The reflection electrode 113 is disposed on the organic layer 114corresponding to the reflection region 128. In this exemplaryembodiment, the reflection electrode 113 is disposed along the convexand concave of the organic layer 114 so that the externally providedlight is reflected from the reflection electrode 113 into apredetermined direction. The reflection electrode 113 includes aconductive material so that the reflection electrode 113 is electricallyconnected to the drain electrode 118 c through the transparent electrode112.

A first alignment layer (not shown) and a second alignment layer (notshown) may be disposed on the first and second substrates 170 and 180,respectively, to align the liquid crystal layer 108. The first andsecond alignment layers (not shown) may be rubbed in predetermineddirections. In this exemplary embodiment, the rubbing direction of thefirst alignment layer (not shown) of the first substrate 170 is oppositeto that of the second alignment layer (not shown) of the secondsubstrate 180.

The liquid crystal layer 108 is interposed between the first and secondsubstrates 170 and 180, and sealed by the sealant (not shown). Theliquid crystal layer 108 may include a vertical alignment (VA) mode, atwisted nematic (TN) mode, a mixed twisted nematic (MTN) mode or ahomogeneous alignment mode. In this exemplary embodiment, the liquidcrystal layer 108 includes the vertical alignment (VA) mode.

When the voltages are applied to the transparent electrode 112, thereflection electrode 113 and the common electrode 106, a distortedelectric field is formed in a region adjacent to the protruded portion115 and the spacer 110, a stepped portion between the transmissionwindow 129 a and the reflection region 128, and a region adjacent toeach of the openings 130 a for the multi-domain. When the distortedelectric field is applied to the vertically aligned liquid crystal layer108, the multi-domain is formed in the vertically aligned liquid crystallayer 108 so that the viewing angle of the LCD apparatus is improved.

FIGS. 5A to 5H are cross-sectional views illustrating a method ofmanufacturing an LCD apparatus according to an exemplary embodiment ofthe present invention.

Referring to FIG. 5A, the lower plate 120 includes the pixel region 140and the blocking region 145. The pixel region 140 includes thetransmission window 129 a and the reflection region 128. The internallyprovided light generated from the backlight assembly (not shown) passesthrough the transmission window 129 a, and the externally provided lightis reflected from the reflection region 128.

Referring to FIG. 5B, a conductive material is deposited on the lowerplate 120. The deposited conductive material is partially removed toform the gate electrode 118 b and the gate line 118 b′. The gateinsulating layer 126 is deposited on the lower plate 120 having the gateelectrode 118 b and the gate line 118 b′. The gate insulating layer 126includes a transparent conductive material. In this exemplaryembodiment, the gate insulating layer 126 includes silicon oxide (SiOx),silicon nitride (SiNx), etc.

Amorphous silicon and N+ type amorphous silicon are deposited on thegate insulating layer 126 and etched to form the semiconductor layer onthe gate insulating layer 126 corresponding to the gate electrode 118 b.A conductive material is deposited on the gate insulating layer 126having the semiconductor layer. The conductive material deposited on thegate insulating layer 126 is partially etched to form the sourceelectrode 118 a, the source line 118 a′ and the drain electrode 118 c.Therefore, the TFT 119 including the source electrode 118 a, the gateelectrode 118 b, the drain electrode 118 c and the semiconductor layeris formed on the lower plate 120.

A transparent insulating material is deposited over the lower plate 120having the TFT 119. In this exemplary embodiment, the transparentinsulating material includes the silicon oxide (SiOx), the siliconnitride (SiNx), etc.

Referring to FIG. 5C, the deposited transparent material and the gateinsulating layer 126 are partially removed to form the contact hole andthe opening 130 a for the multi-domain disposed on the central line ofthe transmission window 129 a. The drain electrode 118 c is partiallyexposed through the contact hole. Therefore, the passivation layer 116including the contact hole and the opening 130 a for the multi-domain isformed on the lower plate 120 having the TFT 119.

Referring to FIG. 5D, an organic material is coated over the passivationlayer 116 having the contact hole and the opening 130 a for themulti-domain. In this exemplary embodiment, the organic materialincludes photoresist.

Referring to FIG. 5E, the coated organic material 114′ is exposed anddeveloped to form an organic layer 114 including a contact hole, thetransmission window 129 a, the convex and concave and the protrudedportion 115. The drain electrode 118 c is partially exposed through thecontact hole. The photo process includes exposure and developing steps.The photo process may be performed using one mask or a plurality of themasks. When a single mask is used to form the contact hole, thetransmission window 129 a, the convex and concave and the protrudedportion 115, the mask includes an opaque portion, a translucent portionand the transparent portion. In this exemplary embodiment, the opaqueportion corresponds to the protruded portion 115. The translucentportion corresponds to the convex and concave. The transparent portioncorresponds to the transmission window 129 a. Alternatively, the maskmay include a slit.

Referring to FIG. 5F, a transparent conductive material is deposited onthe organic layer 114, on the passivation layer 116, in the contact holeand in the transmission window 129 a. The transparent conductivematerial includes indium tin oxide (ITO), indium zinc oxide (IZO), zincoxide (ZO), etc. In this exemplary embodiment, the transparentconductive material includes indium tin oxide (ITO). The depositedtransparent conductive material is partially etched to form thetransparent electrode 112. The transparent electrode 112 is formed inthe pixel region 140.

A conductive material having high reflectivity is then deposited on thelower plate 120 having the organic layer 114. In this exemplaryembodiment, the conductive material having the high reflectivityincludes aluminum (Al) and neodymium (Nd). The deposited conductivitymaterial having the high reflectivity is partially etched to form thereflection electrode 113 in the reflection region 128.

Alternatively, the reflection electrode 113 may have a multi-layeredstructure. When the reflection electrode 113 has the multi-layeredstructure, the reflection electrode 113 includes a molybdenum-tungsten(Mo—W) alloy layer and an aluminum-neodymium (Al—Nd) alloy layerdisposed on the molybdenum-tungsten (Mo—W) alloy layer. The reflectionelectrode 113 is electrically connected to the drain electrode 118 cthrough the transparent electrode 112 and the contact hole.

Alternatively, the transparent electrode 112 may be formed on thetransmission window 129 a and the inner surface of the opening 130 a forthe multi-domain, and the reflection electrode 113 is formed on theorganic layer 114 and the inner surface of the contact hole so that thetransparent electrode 112 is electrically connected to the drainelectrode 118 c through the reflection electrode 113.

Therefore, the second substrate 180 having the lower plate 120, the TFT119, the source line 118 a′, the gate line 118 b′, the organic layer114, the transparent electrode 112 and the reflection electrode 113 iscompleted.

Referring to FIG. 5G, an opaque material is deposited on the upper plate100. The deposited opaque material is partially removed to form theblack matrix 102. Alternatively, the opaque material and photoresist maybe coated on the upper plate 100, and the black matrix 102 may then beformed through the photo process. The photo process includes theexposure and developing steps. The black matrix 102 may also be formedon the lower plate 120.

The color filter 104 is formed on the upper plate 100 having the blackmatrix 102. The light having a predetermined wavelength may pass throughthe color filter 104. Alternatively, the color filter 104 may also beformed on the lower plate 120. When the color filter 104 is formed onthe lower plate 120, the color filter may be formed under the organiclayer 114. In this exemplary embodiment, the color filter 104 is formedthrough the photo process.

A transparent conductive material is deposited on the upper plate 100having the color filter 104 and the black matrix 102 to form the commonelectrode 106. The transparent conductive material includes indium tinoxide (ITO), indium zinc oxide (IZO), zinc oxide (ZO), etc.

An organic material is coated on the common electrode 106. In thisexemplary embodiment, the organic material includes the photoresist. Thecoated organic material is exposed and developed to form the spacer 110.The spacer 110 is disposed on the common electrode 106 corresponding tothe black matrix 102. Alternatively, a ball spacer may be disposed onthe common electrode 106. The spacer 110 may also be disposed on thelower plate 120.

Therefore, the first substrate 170 including the upper plate 100, theblack matrix 102, the color filter 104, the common electrode 106 and thespacer 110 is completed.

Referring to FIG. 5H, the first substrate 170 is combined with thesecond substrate 180.

The liquid crystal is injected into a space between the first and secondsubstrates 170 and 180. The injected liquid crystal is sealed by thesealant (not shown) to form the liquid crystal layer 108. Alternatively,the liquid crystal may be dropped on the first substrate 170 or thesecond substrate 180 having the sealant (not shown) so that the firstsubstrate 170 is combined with the second substrate 180 to form theliquid crystal layer 108.

According to the present embodiment, the arrangement of the verticallyaligned liquid crystal disposed in the region adjacent to the protrudedportion 115, the stepped portion between the transmission 129 a and thereflection region 128 and the opening 130 a for the multi-domain iscontrolled to form the four domains in the transmission window 129 a.

FIG. 6 is a plan view illustrating an LCD apparatus according to anotherexemplary embodiment of the present invention. FIG. 7 is a plan viewillustrating multi-domains formed in a transmission window shown in FIG.6. FIG. 8 is a cross-sectional view taken along the III-III′ line shownin FIG. 6.

The LCD apparatus of FIGS. 6 and 8 is same as in FIGS. 1 to 4 excepttransmission windows and openings for multi-domains. Thus, the samereference numerals will be used to refer to the same or like parts asthose described in FIGS. 1 to 4 and any further explanation will beomitted.

Referring to FIGS. 6 to 8, a second substrate 180 includes a pixelregion 140 and a blocking region 145. The pixel region 140 includes twotransmission windows 129 b and a reflection region 128. In thisexemplary embodiment, each of the transmission windows 129 b has arectangular shape. Alternatively, the pixel region 140 may include aplurality of the transmission windows.

A gate insulating layer 126 is disposed over a lower plate 120 having agate electrode 118 b. A passivation layer 116 is disposed over the lowerplate 120 having a TFT 119.

The passivation layer 116 includes a contact hole and two openings 130 bfor multi-domains. A drain electrode 118 c is partially exposed throughthe contact hole. The openings 130 b for the multi-domains are disposedin the transmission windows 129 b, respectively. In this exemplaryembodiment, the openings 130 b for the multi-domains are disposed on thecentral line of the transmission windows 129 b, respectively. Each ofthe openings 130 b for the multi-domains has a rectangular shape. A sidelength of each of the openings 130 b for the multi-domains isrepresented by a reference numeral ‘w’. The gate insulating layer 126corresponding to the openings 130 b for the multi-domains is alsopartially opened.

An organic layer 114 defines the transmission windows 129 b that areopened. The organic layer 114 includes a contact hole. The drainelectrode 118 c is partially exposed through the contact hole.

The transparent electrode 112 is formed on the organic layer 114corresponding to the pixel region 140, in the contact hole and in thetransmission windows 129 b. A reflection electrode 113 is disposed onthe organic layer 114 corresponding to the reflection region 128 so thata light that is provided from an exterior to the LCD apparatus isreflected from the reflection electrode 113. Alternatively, thereflection electrode 113 may not be formed in a region between thetransmission windows 129 b.

Referring to FIG. 7, four domains are formed in each of the transmissionwindows 129 b. Each of the openings 130 b for the multi-domains isdisposed on a center of the four domains. The four domains are disposedadjacent to each of the openings 130 c for the multi-domains.

According to the present embodiment, when voltages are applied to thetransparent electrode 112, the reflection electrode 113 and the commonelectrode 106, a distorted electric field is formed in a region adjacentto the protruded portion 115 and the spacer 110, a stepped portionbetween the transmission window 129 b and the reflection region 128, anda region adjacent to each of the openings 130 b for the multi-domains.When the distorted electric field is applied to the vertically alignedliquid crystal layer 108, eight domains are formed in the verticallyaligned liquid crystal layer 108 so that the viewing angle of the LCDapparatus is improved.

FIG. 9 is a plan view illustrating an LCD apparatus according to anotherexemplary embodiment of the present invention.

The LCD apparatus of FIG. 9 is same as in FIGS. 6 to 8 excepttransmission windows and openings for multi-domains. Thus, the samereference numerals will be used to refer to the same or like parts asthose described in FIGS. 6 to 8 and any further explanation will beomitted.

Referring to FIGS. 8 and 9, a second substrate 180 includes a pixelregion 140 and a blocking region 145. The pixel region 140 includes twotransmission windows 129 c and a reflection region 128. Each of thetransmission windows 129 c has a hexagonal shape.

A passivation layer 116 includes a contact hole and two openings 130 cfor multi-domains. A drain electrode 118 c is partially exposed throughthe contact hole. The openings 130 c for the multi-domains are disposedin the transmission windows 129 c, respectively. In this exemplaryembodiment, the openings 130 c for the multi-domains are disposed on thecentral line of the transmission windows 129 c. Each of the openings 130c for the multi-domains has a hexagonal shape.

An organic layer 114 corresponding to the transmission windows 129 c isopened, and the organic layer 114 includes a contact hole. The drainelectrode 118 c is partially exposed through the contact hole.

The transparent electrode 112 is formed on the organic layer 114corresponding to the pixel region 140, in the contact hole and in thetransmission windows 129 c. A reflection electrode 113 is disposed onthe organic layer 114 corresponding to the reflection region 128 so thata light that is externally provided to LCD apparatus is reflected fromthe reflection electrode 113.

A plurality of domains is formed in each of the transmission windows 129c. Each of the openings 130 c for the multi-domains is disposed on acenter of the domains. The domains are disposed adjacent to each of theopenings 130 c for the multi-domains.

According to the present embodiment, when voltages are applied to thetransparent electrode 112, the reflection electrode 113 and the commonelectrode 106, a distorted electric field is formed in a region adjacentto the protruded portion 115 and the spacer 110, a stepped portionbetween the transmission window 129 c and the reflection region 128, anda region adjacent to each of the openings 130 c for the multi-domains.When the distorted electric field is applied to the vertically alignedliquid crystal layer 108, twelve domains are formed in the verticallyaligned liquid crystal layer 108 so that the viewing angle of the LCDapparatus is improved.

FIG. 10 is a plan view illustrating an LCD apparatus according toanother exemplary embodiment of the present invention.

The LCD apparatus of FIG. 10 is same as in FIGS. 6 to 8 excepttransmission windows and openings for multi-domains. Thus, the samereference numerals will be used to refer to the same or like parts asthose described in FIGS. 6 to 8 and any further explanation will beomitted.

Referring to FIGS. 8 and 10, a second substrate 180 includes a pixelregion 140 and a blocking region 145. The pixel region 140 includes twotransmission windows 129 d and a reflection region 128. Each of thetransmission windows 129 d has an octagonal shape.

A passivation layer 116 includes a contact hole and two openings 130 dfor multi-domains. A drain electrode 118 c is partially exposed throughthe contact hole. The openings 130 d for the multi-domains are disposedin the transmission windows 129 d, respectively. In this exemplaryembodiment, the openings 130 d for the multi-domains are disposed on thecentral line of the transmission windows 129 d. Each of the openings 130d for the multi-domains has a hexagonal shape.

An organic layer 114 defines the transmission windows 129 d that isopened, and the organic layer 114 includes a contact hole. The drainelectrode 118 c is partially exposed through the contact hole.

The transparent electrode 112 is formed on the organic layer 114corresponding to the pixel region 140, in the contact hole and in thetransmission windows 129 d. A reflection electrode 113 is disposed onthe organic layer 114 corresponding to the reflection region 128 so thata light that is externally provided to the LCD apparatus is reflectedfrom the reflection electrode 113.

A plurality of domains is formed in each of the transmission windows 129d. Each of the openings 130 d for the multi-domains is disposed on acenter of the domains. The domains are disposed adjacent to each of theopenings 130 d for the multi-domains.

According to the present embodiment, when voltages are applied to thetransparent electrode 112, the reflection electrode 113 and the commonelectrode 106, a distorted electric field is formed in a region adjacentto the protruded portion 115 and the spacer 110, a stepped portionbetween the transmission window 129 d and the reflection region 128, anda region adjacent to each of the openings 130 d for the multi-domains.When the distorted electric field is applied to the vertically alignedliquid crystal layer 108, sixteen domains are formed in the verticallyaligned liquid crystal layer 108 so that the viewing angle of the LCDapparatus is improved.

Referring again to FIGS. 6, 9 and 10, when the transmission windows 129b, 129 c and 129 d are disposed in one pixel region 140, the length ofthe stepped portion between the transmission windows 129 b, 129 c and129 d and the organic layer 114 increases so that the alignment of theliquid crystal adjacent to the stepped portion may be disturbed, therebydeteriorating the image display quality.

FIG. 11 is a plan view illustrating an LCD apparatus according toanother exemplary embodiment of the present invention. FIG. 12 is a planview illustrating a multi-domain formed in a transmission window shownin FIG. 11. FIG. 13 is a cross-sectional view taken along the IV-IV′line shown in FIG. 11. FIG. 14 is a cross-sectional view taken along theV-V′ line shown in FIG. 11.

The LCD apparatus of FIGS. 11 to 14 is same as in FIGS. 1 to 4 exceptopenings for a multi-domain. Thus, the same reference numerals will beused to refer to the same or like parts as those described in FIGS. 1 to4 and any further explanation will be omitted.

Referring to FIGS. 11 and 14, the LCD apparatus includes a firstsubstrate 270, a second substrate 280 and a liquid crystal layer 208.

The first substrate 270 includes an upper plate 200, a black matrix 202,a color filter 204, a common electrode 206 and a spacer 210. The secondsubstrate 280 includes a lower plate 220, a TFT 219, a source line 218a′, a gate line 218 b′, a gate insulating layer 226, a passivation layer216, a transparent electrode 212 and a reflection electrode 213. Theliquid crystal layer 208 is interposed between the first and secondsubstrates 270 and 280.

The second substrate 280 includes a pixel region 240 and a blockingregion 245. An image is displayed in the pixel region 240, andinternally and externally provided lights are blocked in the blockingregion 245. The pixel region 240 includes a transmission window 229 aand a reflection region 228. The internally provided light generatedfrom a backlight assembly passes through the transmission window 229 a,and the light that is externally provided to the LCD apparatus isreflected from the reflection region 228. For example, the transmissionwindow 229 a may have a rectangular shape extended in a longitudinaldirection in substantially parallel with the source line 218 a′.

The upper and lower plates 200 and 220 include a transparent glass. Theinternally and externally provided lights may pass through thetransparent glass.

The black matrix 202 is disposed in the reflection region 228 of theupper plate 200 to block the internally and externally provided lights.The black matrix 202 blocks the internally and externally providedlights passing through the blocking region 245 to improve the imagedisplay quality. An opaque material comprising photoresist may be coatedon the upper substrate 200 to form the black matrix 202 through a photoprocess.

The color filter 204 is formed on the upper plate 200 having the blackmatrix 202 so that the internally and externally provided lights havinga predetermined wavelength may pass through the color filter 204.

The common electrode 206 is formed on the upper substrate 200 having theblack matrix 202 and the color filter 204.

The spacer 210 is formed on the upper substrate 200 having the commonelectrode 206. The first substrate 270 is spaced apart from the secondsubstrate 280 by the spacer 210.

The TFT 219 is disposed in the reflection region 228 of the lower plate220, and includes a source electrode 218 a, a gate electrode 218 b, adrain electrode 218 c and a semiconductor layer pattern. A drivingintegrated circuit (not shown) supplies the source electrode 218 a witha data voltage through the source line 218 a′, and supplies the gateelectrode 218 b with a gate signal through the gate line 218 b′.

The storage capacitor (not shown) is formed on the lower plate 220 tomaintain a voltage difference between the reflection electrode 213 andthe common electrode 206 and between the transparent electrode 212 andthe common electrode 206. The storage capacitor (not shown) may be anend-gate type or an isolated line type.

The gate insulating layer 226 is formed over the lower substrate havingthe gate electrode 218 b so that the gate electrode 218 b iselectrically insulated from the source electrode 218 a and the drainelectrode 218 c.

The passivation layer 216 is disposed over the lower substrate 220having the TFT 219, and includes a contact hole. The drain electrode 218c is partially exposed through the contact hole.

The passivation layer 216 includes three openings 230 a for amulti-domain to form the multi-domain in the liquid crystal layer 208.The openings 230 a for the multi-domain are disposed in the transmissionwindow 229 a. In this exemplary embodiment, the openings 230 a for themulti-domain are disposed on the central line of the transmission window229 a. Each of the openings 230 a for the multi-domain has a rectangularshape. A side length of each of the openings 230 a is represented by areference numeral ‘w’. A distance ‘d’ between a side of one of theopenings 230 a for the multi-domain and a side of the transmissionwindow 229 a adjacent to each other is substantially equal to aninterval ‘i’ between sides of the openings 230 a for the multi-domainadjacent to each other. The transmission window 229 a includes a firstside that is in substantially parallel with the gate line 218 b′ and asecond side that is in substantially perpendicular to the first side.

In this exemplary embodiment, the gate insulating layer 226corresponding to the openings 230 a for the multi-domain is also opened.

The organic layer 214 is disposed on the lower plate 220 having the TFT219 and the passivation layer 226 so that the TFT 219 is electricallyinsulated from the transparent electrode 212 and the reflectionelectrode 213.

The organic layer 214 includes convex and concave disposed on the uppersurface of the organic layer 214. The convex and concave improve thereflectivity of the reflection electrode 213. In this exemplaryembodiment, the convex and concave improve the reflectivity of thereflection electrode 213 viewed from a front of the liquid crystaldisplay apparatus. A protruded portion 215 is disposed on a portion ofthe organic layer 214 where the source line 218 a′ is overlapped withthe gate line 218 b′.

Referring again to FIG. 12, twelve domains are disposed in thetransmission window 229 a to form the multi-domain. Four domains of thetwelve domains are disposed adjacent to each of the openings 230 a forthe multi-domain, and a center of the four domains corresponds to theopenings 230 a for the multi-domain. The four domains are disposedadjacent to the openings 230 a for the multi-domain.

The transparent electrode 212 is disposed on the organic layer 214corresponding to the pixel region 240, in the contact hole and in thetransmission window 229 a so that the transparent electrode 212 iselectrically connected to the drain electrode 218 c.

The reflection electrode 213 is disposed on the organic layer 214corresponding to the reflection region 228.

A first alignment layer (not shown) and a second alignment layer (notshown) are disposed on the first and second substrates 270 and 280,respectively. The first and second alignment layers (not shown) arerubbed in predetermined directions.

The liquid crystal layer 208 is interposed between the first and secondsubstrates 270 and 280, and sealed by the sealant (not shown). Theliquid crystal layer 208 is vertically aligned.

When the voltages are applied to the transparent electrode 212, thereflection electrode 213 and the common electrode 206, a distortedelectric field is formed in a region adjacent to the protruded portion215 and the spacer 210, a stepped portion between the transmissionwindow 229 a and the reflection region 228, and a region adjacent toeach of the openings 230 a for the multi-domain. When the distortedelectric field is applied to the vertically aligned liquid crystal layer208, the multi-domain is formed in the vertically aligned liquid crystallayer 208 so that a viewing angle of the LCD apparatus is improved.

In addition, a plurality of the openings 130 a for the multi-domain isdisposed in one transmission window 229 a so that the length of thestepped portion between the transmission window 229 a and the reflectionregion 229 is decreased, thereby improving the image display quality.

Furthermore, a distance ‘d’ is substantially equal to an interval ‘i’ sothat the domains having different shapes are formed, thereby increasingthe viewing angle of the LCD apparatus.

FIG. 15 is a plan view illustrating an LCD apparatus according to anexemplary embodiment of the present invention. FIG. 16 is a plan viewillustrating a multi-domain formed in a transmission window shown inFIG. 15. FIG. 17 is a cross-sectional view taken along the VI-VI′ lineshown in FIG. 16.

The LCD apparatus of FIGS. 15 to 17 is same as in FIGS. 1 to 4 exceptopenings for a multi-domain. Thus, the same reference numerals will beused to refer to the same or like parts as those described in FIGS. 1 to4 and any further explanation will be omitted.

Referring to FIGS. 15 and 17, the LCD apparatus includes a firstsubstrate 270, a second substrate 280 and a liquid crystal layer 208.

The second substrate 280 includes a lower plate 220, a TFT 219, a sourceline 218 a′, a gate line 218 b′, a gate insulating layer 226, apassivation layer 216, a transparent electrode 212 and a reflectionelectrode 213.

The second substrate 280 includes a pixel region 240 and a blockingregion 245. An image is displayed in the pixel region 240, andinternally and externally provided lights are blocked in the blockingregion 245. The pixel region 240 includes a transmission window 229 band a reflection region 228. For example, the transmission window 229 bmay have a rectangular shape extended in a longitudinal direction insubstantially parallel with the source line 218 a′.

The passivation layer 216 is disposed over the lower substrate 220having the TFT 219, and includes a contact hole. The drain electrode 218c is partially exposed through the contact hole.

The passivation layer 216 includes two openings 230 b for a multi-domainto form the multi-domain in the liquid crystal layer 208. The openings230 b for the multi-domain are disposed in the transmission window 229b. In this exemplary embodiment, the openings 230 b for the multi-domainare disposed on the central line of the transmission window 229 b. Eachof the openings 230 b for the multi-domain has a rectangular shape. Aside length of each of the openings 230 b for the multi-domain isrepresented by a reference numeral ‘w’. A distance ‘d’ between a side ofone of the openings 230 b for the multi-domain and a side of thetransmission window 229 b adjacent to each other is about a half of aninterval ‘i’ between sides of the openings 230 b for the multi-domainadjacent to each other.

In this exemplary embodiment, the gate insulating layer 226corresponding to the openings 230 b for the multi-domain is also opened.

Referring again to FIG. 16, eight domains are disposed in thetransmission window 229 b to form the multi-domain. Four domains of theeight domains are disposed adjacent to each of the openings 230 b forthe multi-domain, and a center of the four domains corresponds to theopenings 230 b for the multi-domain. The four domains are disposedadjacent to the openings 230 b for the multi-domain.

When the voltages are applied to the transparent electrode 212, thereflection electrode 213 and the common electrode 206, a distortedelectric field is formed in a region adjacent to each of the openings230 b for the multi-domain. When the distorted electric field is appliedto the vertically aligned liquid crystal layer 208, the multi-domain isformed in the vertically aligned liquid crystal layer 208 so that theviewing angle of the LCD apparatus is improved.

In addition, a plurality of the openings 230 b for the multi-domain isdisposed in one transmission window 229 b so that the length of thestepped portion between the transmission window 229 b and the reflectionregion 229 is decreased, thereby improving the image display quality.

Furthermore, the distance ‘d’ is about a half of the interval ‘i’ sothat the domains have substantially identical shapes to one another.

FIG. 18 is a plan view illustrating an LCD apparatus according to anexemplary embodiment of the present invention. FIG. 19 is a plan viewillustrating a multi-domain formed in a transmission window shown inFIG. 18. FIG. 20 is a cross-sectional view taken along the line VII-VII′shown in FIG. 18.

The LCD apparatus of FIGS. 18 to 20 is same as in FIGS. 1 to 4 exceptopenings for a multi-domain. Thus, the same reference numerals will beused to refer to the same or like parts as those described in FIGS. 1 to4 and any further explanation will be omitted.

Referring to FIGS. 18 to 20, the transmission window 229 c has arectangular shape that is extended in a longitudinal direction insubstantially parallel with a source line 218 a′.

A passivation layer 216 is disposed over a lower substrate 220 having aTFT 219, and includes a contact hole. A drain electrode 218 c ispartially exposed through the contact hole.

The passivation layer 216 includes three openings 230 c for amulti-domain to form the multi-domain in the liquid crystal layer 208.The openings 230 c for the multi-domain are disposed in the transmissionwindow 229 c. The openings 230 c for the multi-domain are arranged insubstantially parallel with a central line of the transmission window229 c. Each of the openings 230 c for the multi-domain has an extendedrectangular shape that is extended in the longitudinal direction. A sidelength of each of the openings 230 c for the multi-domain in thelongitudinal direction in substantially parallel with the source line218 a′ is represented by a reference numeral ‘w1’, and a side length ofeach of the openings 230 c in a horizontal direction in substantiallyparallel with the gate line 218 b′ is represented by a reference numeral‘w2’. A distance ‘d’ between a side of one of the openings 230 c for themulti-domain and a side of the transmission window 229 c adjacent toeach other is substantially identical to an interval ‘I″’ between sidesof the openings 230 c for the multi-domain adjacent to each other.

In this exemplary embodiment, each of the openings 230 c for themulti-domain has a substantially identical shape to the transmissionwindow 229 c.

When three openings 230 c for the multi-domain are disposed in thetransmission window 229 c, and each of the openings 230 c for themulti-domain has a substantially identical shape to the transmissionwindow 229 c, the longitudinal length and the horizontal length of thetransmission window 229 c are represented by ‘2d+2i″+3w1’ and ‘2d+w2’.

Equation 1 represents the ratio of the longitudinal length 2d+2i″+3w1 ofthe transmission window 229 c to the horizontal length 2d+w2 of thetransmission window 229 c and the ratio of the longitudinal side lengthw1 of each of the openings 230 c for the multi-domain to the horizontalside length w2 of each of the openings 230 c for the multi-domain.Equation 1d=i″,2d+2i″+3w1:2d+w2=w1:w2  Equation 1

When the longitudinal length 2d+2i″+3w1 of the transmission window 229 cand the horizontal length 2d+w2 of the transmission window 229 c areabout 210 μm and about 70 μm, respectively, the longitudinal side lengthw1 of each of the openings 230 c for the multi-domain and the horizontalside length w2 of each of the openings 230 c for the multi-domain areabout 30 μm and about 10 μm, respectively.

Alternatively, the transmission window 229 c may also include aplurality of the openings 230 c for the multi-domain. When the number ofthe openings 230 c in one transmission window 229 c is ‘n’, thelongitudinal length and the horizontal length of the transmission window229 c are represented by ‘2d+(n−1)i″+3w1’ and ‘2d+w2’, respectively.

Equation 2 represents the ratio of the longitudinal length2d+(n−1)i″+3w1 of the transmission window 229 c to the horizontal length2d+w2 of the transmission window 229 c and the ratio of the longitudinalside length w1 of each of the openings 230 c to the horizontal sidelength w2 of each of the openings 230 c.Equation 2.d=i″,2d+(n−1)i″+3w1:2d+w2=w1:w2  Equation 2

In this exemplary embodiment, the gate insulating layer 226corresponding to the openings 230 c for the multi-domain is also opened.

Referring again to FIG. 19, twelve domains are disposed in thetransmission window 229 c to form the multi-domain. Four domains of thetwelve domains are disposed adjacent to each of the openings 230 c forthe multi-domain, and a center of the four domains corresponds to theopenings 230 c for the multi-domain. The four domains are disposedadjacent to the openings 230 c for the multi-domain. The domainsdisposed upper/lower portions of the openings 230 c for the multi-domainare horizontally extended, and the domains disposed left/right portionsof the openings 230 c for the multi-domain are longitudinally extended.

When the voltages are applied to the transparent electrode 212, thereflection electrode 213 and the common electrode 206, a distortedelectric field is formed in a region adjacent to each of the openings230 c for the multi-domain. When the distorted electric field is appliedto the vertically aligned liquid crystal layer 208, the multi-domain isformed in the vertically aligned liquid crystal layer 208 so that theviewing angle of the LCD apparatus is improved.

In addition, each of the openings 230 c for the multi-domain has asubstantially identical shape to the transmission window 229 c so thatthe domains have various shapes.

FIG. 21 is a plan view illustrating an LCD apparatus according toanother exemplary embodiment of the present invention. FIG. 22 is across-sectional view taken along the line VIII-VIII′ shown in FIG. 21.

The LCD apparatus of FIGS. 21 and 22 is same as in FIGS. 1 to 4 exceptopenings for a multi-domain. Thus, the same reference numerals will beused to refer to the same or like parts as those described in FIGS. 1 to4 and any further explanation will be omitted.

Referring to FIGS. 21 and 22, the LCD apparatus includes a firstsubstrate 370, a second substrate 380 and a liquid crystal layer 308.

The first substrate 370 includes an upper plate 300, a black matrix 302,a color filter 304, an overcoating layer 305, a common electrode 306 anda spacer 310.

The second substrate 380 includes a lower plate 320, a TFT 319, a gateinsulating layer 326, a passivation layer 316, a transparent electrode312 and a reflection electrode 313. The second substrate 380 furtherincludes a pixel region 340 and a blocking region 345.

The pixel region 340 includes a reflection region 349 and a transmissionwindow 329. The light that is externally provided to the LCD apparatusis reflected from the reflection region 349, and the internally providedlight generated from a backlight assembly (not shown) passes through thetransmission window 329.

The TFT 319 and the reflection electrode 313 are disposed in thereflection region 328, and the transmission electrode 312 is disposed inthe transmission window 329.

The blocking region 345 is disposed adjacent to the pixel region 340. Asource line 318 a′, a gate line 318 b′, a driving integrated circuit(not shown), etc., are disposed in the blocking region 345.

The black matrix 302 is disposed on the upper plate 300 corresponding tothe blocking region 345.

The color filter 304 is formed on the upper plate 300 so that theinternally and externally provided light having a predeterminedwavelength may pass through the color filter 304. The color filter 304includes a slit 303 disposed at a position corresponding to thereflection electrode 313.

The overcoating layer 305 that includes a first overcoating portion 305a and a second overcoating portion 305 b and the common electrode 306are alternately disposed on the upper plate 300 having the black matrix302 and the color filter 304. The common electrode 306 b correspondingto the transmission window 329 is disposed on the first overcoatingportion 305 a that is disposed on the color filter 304. The commonelectrode 306 a corresponding to the blocking region 345 and thereflection region 328 is disposed between the color filter 304 and thesecond overcoating portion 305 b.

A height of the common electrode 306 b corresponding to the transmissionwindow 329 is different from that of the common electrode 306 acorresponding to the blocking region 345 and the reflection region 328so that the intensity of the electric field formed in the liquid crystallayer 308 corresponding to the transmission window 329 is different fromthat of the electric field formed in the liquid crystal layer 308corresponding to the reflection region 328, although a cell-gap of theliquid crystal layer 308 corresponding to the reflection region 328 issubstantially equal to a cell-gap of the liquid crystal layer 308corresponding to the transmission window 329.

The overcoating layer 305 protects the color filter 304 from impurities,particles, etc., and planarizes the stepped portion formed by the blackmatrix 302 and the color filter 304.

The spacer 310 is formed on the upper plate 300 having the black matrix302, the color filter 304, the overcoating layer 305 and the commonelectrode 306.

The TFT 319 is disposed on the lower plate 320, and includes a sourceelectrode 318 a, a gate electrode 318 b, a drain electrode 318 c and asemiconductor layer pattern.

A storage capacitor (not shown) is disposed on the lower plate 320 tomaintain the voltage difference between the common electrode 306 and thereflection electrode 313 and between the common electrode 306 and thetransparent electrode 312.

The gate insulating layer 326 is disposed over the lower plate 320having the gate electrode 318 b so that the gate electrode 318 b iselectrically insulated from the source electrode 318 a and the drainelectrode 318 c.

The passivation layer 316 is disposed over the lower plate 320 havingthe TFT 319, and includes a contact hole. The drain electrode 318 c ispartially exposed through the contact hole.

The passivation layer 316 and the gate insulating layer 326 includethree openings 330 for a multi-domain. The openings 330 for themulti-domain form the multi-domain in the liquid crystal layer 308. Theopenings 330 for the multi-domain are disposed on the central line ofthe transmission window 329. Each of the openings 330 for themulti-domain has a rectangular shape. A side length of each of theopenings 330 for the multi-domain is represented by a reference numeral‘w’. A distance ‘d’ between a side of one of the openings 330 for themulti-domain and a side of the transmission window 329 adjacent to eachother is substantially equal to an interval ‘i’ between sides of theopenings 330 for the multi-domain adjacent to each other.

The transparent electrode 312 is formed on the passivation layer 316 andthe inner surface of the contact hole that partially exposes thepassivation layer 316 so that the transparent electrode 312 iselectrically connected to the drain electrode 318 c.

The reflection electrode 313 is disposed on the passivation layer 316and a portion of the transparent electrode 312 so that the externallyprovided light is reflected from the reflection electrode 313.

The liquid crystal layer 308 is interposed between the first and secondsubstrates 370 and 380 so that the liquid crystal layer 308 is sealed bya sealant (not shown).

A first alignment layer (not shown) and a second alignment layer (notshown) are disposed on the first and second substrates 370 and 380,respectively, to align the liquid crystal layer 308. The first andsecond alignment layers (not shown) may be rubbed in predetermineddirections, respectively.

According to the present embodiment, the height of the common electrode306 b corresponding to the transmission window 329 is different from theheight of the common electrode 306 a corresponding to the blockingregion 345 and the reflection region 328 so that the opticalcharacteristics of the liquid crystal layer 308 corresponding to thereflection region 328 and the liquid crystal layer 308 corresponding tothe transmission window 329 are optimized.

According to the present invention, the insulating layer includes theopenings for the multi-domain so that the viewing angle and the imagedisplay quality of the LCD apparatus are improved.

Also, the openings for the multi-domain are disposed on the secondsubstrate to form the multi-domain having improved characteristics,although the first substrate is misaligned with the second substrate.For example, the domains in the multi-domain may have substantiallyidentical shapes or different shapes.

Furthermore, the openings for the multi-domain are formed from a samelayer as the contact hole so that the manufacturing process issimplified and the manufacturing cost is decreased.

In addition, a plurality of the openings of the multi-domain may beformed in one transmission window so that the length of the steppedportion adjacent to a side of the transmission window is decreased,thereby improving the image display quality of the LCD apparatus.

Furthermore, the height of the common electrode corresponding to thetransmission window may be different from the height of the commonelectrode corresponding to the blocking region and the reflection regionso that the optical characteristics of the liquid crystal layer areoptimized.

This invention has been described with reference to the exemplaryembodiments. It is evident, however, that many alternative modificationsand variations will be apparent to those having skill in the art inlight of the foregoing description. Accordingly, the present inventionembraces all such alternative modifications and variations as fallwithin the spirit and scope of the appended claims.

1. A method of manufacturing an array substrate, the method comprising:forming a switching element on a plate including a pixel region; formingan inorganic insulating layer on the plate, the inorganic insulatinglayer including an opening for a multi-domain disposed in the pixelregion and a contact hole through which an electrode of the switchingelement is partially exposed; forming an organic layer on the inorganiclayer; and forming a pixel electrode on the inorganic insulating layer,an inner surface of the opening for the multi-domain and an innersurface of the contact hole so that the pixel electrode is electricallyconnected to the electrode of the switching element, and has a firstportion formed on the organic layer, a second portion directly formed onthe inorganic insulating layer and a third portion formed in theopening.
 2. The method of claim 1, wherein the pixel electrode is formedby: forming a transparent electrode on the organic layer, the inorganicinsulating layer corresponding to the pixel region, the inner surface ofthe opening for the multi-domain and the inner surface of the contacthole; and forming a reflection electrode in a reflection region of thepixel region, an externally provided light being reflected from thereflection electrode, wherein the organic layer includes a protrudedportion for the multi-domain on the inorganic insulating layer to definea transmission window that is opened.
 3. The method of claim 1, whereinthe pixel electrode is formed by: forming a transparent electrode on theinorganic insulating layer, the organic layer corresponding to the pixelregion, the inner surface of the opening for the multi-domain and theinner surface of the contact hole; and forming a reflection electrode ina reflection region of the pixel region, an externally provided lightbeing reflected from the reflection electrode, wherein the organic layerincludes the contact hole and a protruded portion for the multi-domainon the inorganic insulating layer to define a transmission window thatis opened.
 4. A method of manufacturing an array substrate, the methodcomprising: forming an inorganic insulating layer on a plate including apixel region having a transmission window through which an internallyprovided light passes, the inorganic insulating layer including aplurality of openings for a multi-domain disposed in the transmissionwindow and a contact hole through which an electrode of a switchingelement is partially exposed; forming an organic layer on the inorganicinsulating layer; and forming a pixel electrode on the organic layer,the inorganic insulating layer, an inner surface of the openings for themulti-domain and an inner surface of the contact hole so that the pixelelectrode is electrically connected to the electrode of the switchingelement, and has a first portion formed on the organic layer, a secondportion directly formed on the inorganic insulating layer and a thirdportion formed in the opening.
 5. The method of claim 4, furthercomprising: forming a gate electrode on the plate; forming a gateinsulating layer on the plate having the gate electrode; forming asemiconductor layer on the gate insulating layer corresponding to thegate insulating layer; and forming a source electrode and a drainelectrode that is spaced apart from the source electrode on thesemiconductor layer.
 6. The method of claim 5, wherein the inorganicinsulating layer is formed by: depositing a transparent insulatingmaterial on the plate having the switching element; and etching thedeposited transparent insulating material and the gate insulating layerto form the openings for the multi-domain and the contact hole.
 7. Themethod of claim 5, wherein the inorganic insulating layer is formed by:depositing a transparent insulating material on the plate having theswitching element; and etching the deposited transparent insulatingmaterial to form the openings for the multi-domain and the contact hole.8. The method of claim 7, further comprising forming the organic layerincluding a protruded portion for the multi-domain on the inorganicinsulating layer, the organic layer defining the transmission windowthat is opened.
 9. The method of claim 8, wherein the pixel electrode isformed by: forming a transparent electrode on the organic layercorresponding to the pixel region, the inner surface of the openings forthe multi-domain and the inner surface of the contact hole; and forminga reflection electrode in a reflection region of the pixel region, anexternally provided light being reflected from the reflection electrode.10. The method of claim 8, wherein the pixel electrode is formed by:forming a transparent electrode on the organic layer, the inorganicinsulating layer corresponding to the pixel region, the inner surface ofthe opening for the multi-domain and the inner surface of the contacthole; and forming a reflection electrode in a reflection region of thepixel region, an externally provided light being reflected from thereflection electrode.